Patent · US Expired

Radiation-sensitive mixture containing acid-labile groups and production of relief patterns

US5318876A · kind A · utility

10Cited by

6References

10Claims

0Family size

Assignee

BASF SE

Inventors

Reinhold Schwalm · Monsheim, DE
Horst Binder · Lampertheim, DE
Dirk Funhoff · Heidelberg, DE

Key dates

Filing date	Apr 3, 1992
Grant date	Jun 7, 1994
Priority date	—
Expiry date	Apr 3, 2012

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/122
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A radiation-sensitive mixture which contains PA0 (a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and PA0 (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more groups cleavable by an acid and in addition a group which forms a strong acid under the action of radiation, and additionally PA0 (c) an alkyl- or arylsulfonate of a hydroxyaromatic, is suitable for the production of relief patterns.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.