Patent · US Expired

Process for sulfur containing derivatives of hydroxyphenyl/benzotriazoles

US5319091A · kind A · utility

17Cited by
5References
50Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 24, 1992
Grant dateJun 7, 1994
Priority date
Expiry dateNov 24, 2012

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08G85/00
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A composition that, when present in a polymer matrix, reduces the deleterious effect of UV light absorption by the polymer is provided, which comprises a sulfur-containing derivative of hydroxyphenylbenzotriazole having the formula of: ##STR1## wherein each X is selected from the group consisting of hydrogen, halogens, cyano, alkyl, phenyl group, biphenyl group, arylthio, amine, ketone, aldehyde, alkoxy, hydroxy, carboxylic acid group, oligomer and combinations thereof and can have carbon atoms up to about 20; n is a whole number from 1 to 5; n' is a whole number from 0 to 4; n" is a whole number from 1 to 2 and each n" can be the same or different; q is an integer from 1 to 10; each Y is selected from the group consisting of --S(O) (O)--, --S(O)--, and --S--; each R can be selected from the group consisting of hydrogen, alkyl group, alkenyl group, aralkyl group, alkaryl group, and combinations thereof and can have 0 to about 10 carbon atoms; each OH group can be at either the 2'- or the 6'-position, or both. Also provided are a composition comprising the sulfur-containing derivative, a process for preparing the derivative, a composition comprising a polymer chemically bonded to th…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.