Closed container to be used in a clean room
US5320218A · kind A · utility
445Cited by
4References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 5, 1993 |
| Grant date | Jun 14, 1994 |
| Priority date | — |
| Expiry date | Apr 5, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/135
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A wafer storing, closed container for use in a clean room of a semiconductor manufacturing system is provided with an attached inert gas tank so as to eliminate the need to convey the container to an inert gas purge station to supplement the inert gas supply in the container due to leakage. A gas passageway is formed in a body of the container in such a manner that one end thereof is open inside the container. The other end is open outside the container. The portable inert gas tank is detachably connected to the other end of the gas passageway so as to automatically supplement the container with the inert gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.