Method of chemical vapor deposition of boron nitride using polymeric cyanoborane
US5320878A · kind A · utility
25Cited by
6References
29Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 10, 1992 |
| Grant date | Jun 14, 1994 |
| Priority date | — |
| Expiry date | Jan 10, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/342
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Polymeric cyanoborane is volatilized, decomposed by thermal or microwave plasma energy, and deposited on a substrate as an amorphous film containing boron, nitrogen and carbon. Residual carbon present in the film is removed by ammonia treatment at an increased temperature, producing an adherent, essentially stoichiometric boron nitride film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.