Effusion method and an effusion cell for forming molecular beams
US5321260A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 31, 1992 |
| Grant date | Jun 14, 1994 |
| Priority date | — |
| Expiry date | Jul 31, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B23/066
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Primary molecules are formed by sublimation in a sublimation chamber (2), they are then transferred at a transfer flow-rate to a decomposition head (10) at a higher temperature, and they are transformed therein into secondary molecules that are lighter in weight to form molecular beams (16). In accordance with the invention, the transfer flow-rate is adjusted by adjusting an effective vector flow-rate which is the vector flow-rate of a vector gas inserted into the sublimation chamber via a feed tube (26) and sucked out via a suction tube (30). The invention applies, in particular, to making III-V type semiconductor components by molecular beam epitaxy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.