Volumetric flow corrector and method
US5323657A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jan 25, 1993 |
| Grant date | Jun 28, 1994 |
| Priority date | — |
| Expiry date | Jan 25, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/225
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus for measuring a base condition volumetric flowrate of a pipeline gas flowing through a pipeline in which a pipeline gas flowrate is measured by a pipeline gas flowmeter that responds to density in a characteristic manner, a sample gas flowrate is measured by a sample gas flowmeter that responds to density in the same manner as a pipeline gas flowmeter, and a base condition sample gas volumetric flowrate is measured by measuring the base condition energy flowrate of the sample gas, measuring the base condition heating value of the sample gas and dividing the base condition energy flowrate by the base condition heating value. The measured pipeline gas flowrate through the pipeline is then adjusted by the ratio of the base condition sample gas flowrate divided by the measured flowrate of the sample gas. The temperature of the sample gas should be substantially the same as the pipeline gas in the pipeline when the sample gas flowrate is measured.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.