Laser reprofiling system employing a photodecomposable mask
US5324281A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 22, 1992 |
| Grant date | Jun 28, 1994 |
| Priority date | — |
| Expiry date | Oct 22, 2012 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61F2009/00872
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A laser system for reprofiling a surface, such as the corneal surface of an eye, comprising a laser and a photoreactive mask disposed between the laser means and the surface for providing a predefined profile of resistance to laser radiation, such that, upon irradiation of the mask, a portion of the laser radiation is selectively absorbed and another portion is transmitted to the surface, in accordance with the mask profile, to selectively erode the surface. The mask can be connected to the support structure and disposed in optical alignment with the laser means and the surface. The mask can be directly integrated with support structure attached to the surface or spatially separated from the surface and imaged onto the surface. In one preferred embodiment, the mask includes a transparent matrix and light-absorbing dispersoids selectively distributed within the matrix, such that the dispersed elements are progressively bleached by exposure to the laser radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.