Process for coating substrate material
US5324552A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Feb 11, 1993 |
| Grant date | Jun 28, 1994 |
| Priority date | — |
| Expiry date | Feb 11, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/562
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
To provide a process for coating substrate material in which coating material is ablated in an ablation region by a laser beam in a coating chamber containing a negative pressure, propagates in the form of a coating particle stream in the direction of the substrate material and is deposited on it in the form of a coating, with which substrate material can be coated in large quantities by laser ablation, it is proposed that the substrate material be flat material, that the flat material be passed continuously as a continuous strip through the coating chamber and coated under the negative pressure substantially maintained therein, and that the necessary coating material be fed to the coating chamber while the negative pressure is substantially maintained therein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.