Photoresist material based on polystyrenes
US5324804A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Apr 22, 1993 |
| Grant date | Jun 28, 1994 |
| Priority date | — |
| Expiry date | Apr 22, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Compounds of formula (I) ##STR1## wherein R.sub.1 is hydrogen, methyl or halogen, n is 2 or 3, and R is C.sub.1 -C.sub.6 alkyl, benzyl, 2-tetrahydrofuranyl, 2-tetrahydropyranyl, C.sub.1 -C.sub.6 alkoxycarbonyl, phenoxycarbonyl or benzyloxycarbonyl, or, if two substituents OR are ortho-positioned to each other, two substituents R together form an ethylene group which may be substituted by up to four C.sub.1 -C.sub.6 alkyl groups, or form a C.sub.2 -C.sub.6 alkylidene group, can be polymerized in the absence or presence of other unsaturated comonomers to polymers having a molecular weight M.sub.w of 10.sup.3 to 10.sup.6 and which are suitable for producing positive photoresists with high resolution and very good contrast.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.