Target for calibrating and testing infrared devices
US5324937A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 21, 1993 |
| Grant date | Jun 28, 1994 |
| Priority date | — |
| Expiry date | Jan 21, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J5/53
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An improved target for testing and calibrating a detection device. The target (10) includes a metal substrate (12) with a first layer (14) of high emissivity material and a second layer (16) of low emissivity material are deposited thereon. In the specific implementation, the substrate (12) is copper, the first layer (14) is chromium-oxide and the second layer (16) is chrome. In the illustrative embodiment, an aperture (22) is drilled through the substrate (12) and the first and second layers (14, 16) thereon. An infrared emitter (20) is located at the aperture (22) to provide point source radiation. A conventional heater (26) is applied to the back surface of the target. A pattern is etched on second layer (16) on the front surface of the target using electron beam lithography. The use of a metal substrate (12) allows for the drilling of small holes more easily than in the conventional target. In addition, the metal substrate (12) provides good temperature uniformity without use of a separate metal plate due to the higher thermal conductivity of metal over glass. The elimination of the separate metal plate also simplifies target assembly and reduces target costs.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.