Apparatus and method for measuring the mass flow rate of liquid from a vessel
US5325727A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 10, 1993 |
| Grant date | Jul 5, 1994 |
| Priority date | — |
| Expiry date | Mar 10, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01F1/34
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The method and apparatus of this invention is related to measuring a flow rate of a liquid having a density .rho. from a vessel having an inner cavity and a pouring channel. A flow sensor introduces a first gas flow into the liquid in the cavity at a first position, the inner cavity having a cross-sectional area A.sub.1 at the first position, and a second gas flow into the liquid in the pouring channel at a second position, the pouring channel having a cross-sectional area A.sub.2 at the second position, there being a vertical distance z between the first and second positions. A transducer provides an output signal proportional to a pressure differential p.sub.1 -p.sub.2 between the first and second gas flows. A processor receives the output signal and determines the liquid flow rate m through the pouring channel according to the proportional relation ##EQU1## where g is gravity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.