Chemical treatment plasma apparatus for forming a ribbon-like plasma
US5328515A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 3, 1993 |
| Grant date | Jul 12, 1994 |
| Priority date | — |
| Expiry date | May 3, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32357
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The apparatus incorporates a h.f. source (2), a plasma enclosure ( 4 ) having gas supplies, a vacuum pump (50), elements for coupling the source to the plasma enclosure, which is of a non-radiating type and which is shaped like a rectangular parallelepiped with first and second dielectric material faces parallel to the direction of the magnetic field and a third face having a rectangular opening (14) parallel to said field for forming a ribbon-like plasma, a treatment enclosure containing a mobile sample holder (18) communicating via the opening with the plasma enclosure. The coupling means have two linear waveguides (30, 38 ) with a rectangular cross-section oriented in the wave propagation direction and located on either side of the plasma enclosure, a horn (36) for coupling one of the guides to the plasma enclosure, whose cross-section widens in the magnetic field direction, the other guide being provided with a short-circuit (46).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.