Linear planar-magnetron sputtering apparatus with reciprocating magnet-array
US5328585A · kind A · utility
35Cited by
6References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 11, 1992 |
| Grant date | Jul 12, 1994 |
| Priority date | — |
| Expiry date | Dec 11, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3497
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A linear planar-magnetron sputtering cathode comprises a cathode body (22) including two side-walls (104) two end-walls (106) and a target-supporting member (102) attached to the walls. The cathode body encloses a magnet array (40) which may be moved reciprocally in at least one direction relative to the cathode body. A cooling fluid may be flowed through the target supporting member for cooling the target. A cooling fluid may also be flowed through the side-walls and the end-walls for cooling the end walls. A cooled enclosure is thus be provided for the magnet-array.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.