Compact substrate heater for use in an oxidizing atmosphere
US5329097A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 19, 1993 |
| Grant date | Jul 12, 1994 |
| Priority date | — |
| Expiry date | May 19, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2001
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A compact heater is designed for the deposition of thin films at high temperatures in an oxidizing atmosphere or in vacuum. The heater is designed to accommodate a small-diameter load-lock system in an ultra-high-vacuum deposition chamber, and can operate in 0 to 1 atmosphere of oxygen up to at least 800.degree. C. The compact design allows the heater, including a substantially isothermal substrate holder having the substrate affixed thereto, included temperature sensor and attached main body portion, to be loaded through a load-lock port with about a 2.5 inch inside diameter. Heat is generated resistively, and the substrates are heated directly by thermal conduction. The heater was designed specifically to heat substrates to precisely monitored temperatures during the growth of high-temperature superconducting thin films.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.