Patent · US Expired

Method of fabricating a microelectronic photomultipler device with integrated circuitry

US5329110A · kind A · utility

28Cited by
11References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 22, 1993
Grant dateJul 12, 1994
Priority date
Expiry dateNov 22, 2013

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J43/04
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A microelectronic photomultiplier device is fabricated by discrete proceds to provide a photocathode-anode and dynode chain arrangement which is analogous in operation to conventional photomultiplier tubes. This microelectronic photomultiplier device provides for low level photon detection and realizes the advantages of high reliability, small size and fast response, plus lower cost, weight and power consumption compared to conventional photomultiplier tubes. In addition, the fabrication on an SOI substrate permits integration of logic and control circuitry with detectors. The insulating substrate also permits the integration of an on-chip high voltage supply and may easily be extended to a plurality of detectors offering improved performance and design flexibility.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.