Measuring laser beam parameters using non-distorting attenuation and multiple simultaneous samples
US5329350A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 21, 1992 |
| Grant date | Jul 12, 1994 |
| Priority date | — |
| Expiry date | May 21, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/02
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical system for the attenuation of laser light for measurement purposes which includes four logical subassemblies including a first attenuator subassembly for the attenuation of high power laser light, a second attenuator subassembly for lower power attenuation of the laser light, a third lens subassembly for collecting beam size data simultaneously at multiple locations in space, and a fourth logical subassembly including a beam measuring assembly for recording the beam size data received from the lens subassembly for analysis of the beam characteristics. The first attenuator subassembly is provided with a pair of reflecting, opposed facing, fixed wedges. The reflecting wedges are selectively tilted to eliminate interference effects between their inward facing reflecting surfaces. The second attenuator subassembly further includes a pair of opposed facing and movable wedges arranged in series with a fixed filter. The lens subassembly includes a positive optical lens for focusing the beam into a series of beam splitters which redirect the beam data for simultaneous collection on a beam measuring assembly. The beam measuring assembly preferably also includes a fixed filter dis…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.