Antireflection layer system with integral UV blocking properties
US5332618A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Feb 7, 1992 |
| Grant date | Jul 26, 1994 |
| Priority date | — |
| Expiry date | Feb 7, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/265
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is directed to an anti-reflection and UV rejection coating. The coating comprises at least eight layers wherein adjoining layers alternate between high and low refractive index materials. The layer adjacent an article on which the coating is formed has a high refractive index greater than about 2.10 at a wavelength of about 520 nanometers and greater than about 2.50 at a wavelength of about 330 nanometers. The index of refraction of the low refractive index material is less than about 1.50 at a wavelength of about 520 nanometers. The two layers of low refractive index material nearest the article each have an optical thickness at a wavelength of about 330 nm of about one-quarter wavelength.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.