Self-apodizing collimator for x-ray lithography
US5333166A · kind A · utility
8Cited by
2References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 28, 1992 |
| Grant date | Jul 26, 1994 |
| Priority date | — |
| Expiry date | Aug 28, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/06
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
A self-apodizing collimator for collimating X-rays for use in VLSI lithography. The paraboloidal collimator uses a graded ML coating to collimate a range of wavelengths along the surface of the paraboloid such that a uniform resist response is provided. In addition, the collimated X-rays have a higher intensity than possible with a system using additional apodizing films.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.