Submicrosecond, synchronizable x-ray source
US5335258A · kind A · utility
13Cited by
14References
17Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 31, 1993 |
| Grant date | Aug 2, 1994 |
| Priority date | — |
| Expiry date | Mar 31, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J35/065
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In the submicrosecond, synchronizable x-ray source a high intensity pulsed laser is focused onto a negatively biased laser target, at high irradiance in a vacuum, producing high temperature plasma from which electrons are emitted. The emitted electrons are accelerated in a electric field formed by impressing a potential difference across a laser target-electron target gap. The positively biased electron target collects the emitted electrons, which upon impact with the electron target cause x-rays to be emitted synchronously with the incident laser pulse.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.