Method of monitoring major constituents in plating baths

US5336380A · kind A · utility

Assignee

• Hughes Aircraft Company · US

Inventors

• Nguyet H. Phan · Los Angeles, US
• Vilambi NRK Reddy · Cranbury, US
• Frank A. Ludwig · Homberg (Efze), DE
• Bruce M. Eliash · Los Angeles, US

Key dates

• Filing date: Mar 25, 1993
• Grant date: Aug 9, 1994
• Expiry date: Mar 25, 2013

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N27/48
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A method of monitoring major constituents within a plating bath. The method involves applying an electrical signal to a working electrode positioned within the plating bath solution, varying signal parameters, and measuring the resultant response signal. The characteristics of the response signal indicate major constituent concentration levels. The method complements and is easily integrated with known voltammetric techniques for analysis of trace constituents, thus forming an integral part of an efficient overall plating bath analysis system. By adjusting major constituent concentration levels in accordance with measurements made using the method of the present invention, a high quality plating bath can be easily and inexpensively maintained.