Curable composition and process for producing shadow mask using the same
US5336574A · kind A · utility
2Cited by
3References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 2, 1992 |
| Grant date | Aug 9, 1994 |
| Priority date | — |
| Expiry date | Oct 2, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2229/0761
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A curable composition comprising the following components (a), (b), (c) and (d) and/or (e): PA1 (a) a compound having one carboxyl group and one (meth)acryloyl group in the molecule, PA1 (b) a compound having two or more (meth)acryloyl groups in the molecule, PA1 (c) a levelling agent, and PA1 (d) a chain transfer agent and/or PA1 (e) a tertiary amine type photoinitiator; and a process for producing a shadow mask, comprising two etching steps, wherein the above curable composition is used as a secondary etching resist material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.