System making it possible to control the shape of a charged particle beam
US5336973A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 31, 1992 |
| Grant date | Aug 9, 1994 |
| Priority date | — |
| Expiry date | Dec 31, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J3/029
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for controlling the shape of a charged particle beam. The particle beam is emitted from a source (58) of the said particles. Said source is associated with a collecting electrode which collects the particles. The system comprises at least one resistive zone (56) and at least two control electrodes (52, 54). The resistive zone and the control electrodes are arranged substantially at the same level as the source. The control electrodes are also placed on either side of the resistive zone and serve to polarize the latter. The electrical resistance profile of the resistive zone is chosen in such a way that it has the potential distribution so that it is possible to obtain the desired shape of the beam from the source when the control electrodes are appropriately polarized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.