Vapor-deposition material for the production of high-refraction optical coatings
US5340607A · kind A · utility
10Cited by
2References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 19, 1993 |
| Grant date | Aug 23, 1994 |
| Priority date | — |
| Expiry date | Mar 19, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/285
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention relates to a vapor-deposition material for the production of high-refraction optical coatings by coating substrates in vacuo. The material is a compound of the formula La.sub.2 TiO.sub.7-x where x=from 0.3 to 0.7.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.