Sensitized onium salts
US5347040A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 9, 1992 |
| Grant date | Sep 13, 1994 |
| Priority date | — |
| Expiry date | Dec 9, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/127
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Onium salt capable of generating acid upon exposure to actinic radiation having the following structure: EQU (R.sub.1).sub.a (R.sub.2).sub.b (R.sub.3).sub.c Q.sup.+ --A--M.sup.+ X.sup.- --B--X'.sup.- where: PA1 Q is S; PA1 R.sub.1, R.sub.2 and R.sub.3 are independently substituted or unsubstituted aromatic, aliphatic, or aralkyl groups having 7-18 carbon atoms; PA1 M.sup.+ is a cationic organic radical; PA1 A is a divalent radical selected from the group of hindered alkylene groups, substituted or unsubstituted aromatic or aralkyl groups; PA1 B is a divalent aromatic sensitizer which absorbs radiation having a wavelength longer than 300 nm and is capable of transferring an electron to Q, PA1 x.sup.- and X'.sup.- are anionic groups; and wherein A provides a spatial separation between Q and M, and B provides a spatial separation between X and X', such that the spatial separation provided by A between Q and M is substantially the same as the spatial separation provided by B between X and X'.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.