Synthesis of semiconductor grade tungsten hexafluoride
US5348723A · kind A · utility
5Cited by
3References
8Claims
0Family size
Assignee
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Key dates
| Filing date | Feb 7, 1990 |
| Grant date | Sep 20, 1994 |
| Priority date | — |
| Expiry date | Feb 7, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01G41/04
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Semiconductor grade tungsten hexafluoride (WF.sub.6) is produced by reacting tungsten metal with a recirculating flow of gaseous WF.sub.6 containing a small concentration of fluorine in a heated reactor. The high purity WF.sub.6 produced is useful for deposition of tungsten metallization in fabricating VLSI integrated circuitry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.