Plate material for shadow mask
US5348827A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Apr 25, 1991 |
| Grant date | Sep 20, 1994 |
| Priority date | — |
| Expiry date | Apr 25, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J29/07
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plate material for a shadow mask, consisting essentially of iron or of iron and nickel and having a surface configuration which stabilizes the adhesion between the plate material and a photoresist and improves the adhesion between the plate material and a negative pattern in the process of producing a shadow mask, thereby enabling improvements in the quality and the productivity, and which causes no annealing adhesion in the shadow mask softening annealing step in the process of producing a color picture tube. The plate material has a surface roughness Ra and a surface roughness projection condition Rsk, which are defined as follows: PA1 Ra: from 0.3 to 0.8.mu.m PA1 Rsk: +0.1 or more PA1 where Ra is the surface roughness specified in JIS B 0601, and Rsk is a value representative of the relativity of an amplitude distribution curve to a mean line, i.e., the projection condition expressed by ##EQU1## where Y(i) is a roughness curve obtained within a reference length of a sectional curve when the mean line and the direction of vertical magnification are assumed to be the X-axis and the Y-axis, respectively; Rq is a quadratic mean roughness; n=230; and j=2 to 5.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.