Method of fabricating thin-film magnetic head
US5349745A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 1, 1993 |
| Grant date | Sep 27, 1994 |
| Priority date | — |
| Expiry date | Jun 1, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49052
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of fabricating a thin-film magnetic in which a mask pattern in etching a bottom pole is formed of first and second mask films in this order when viewed from the bottom pole, the first mask film is used for defining, by self-alignment, the length of that portion of the side edge of a top pole which is nearly perpendicular to a magnetic gap, the second mask film makes it possible to etch the bottom pole with high dimensional accuracy, a non-magnetic film is formed on the mask pattern having the bottom pole thereunder and the exposed region of a substrate, and the top pole is formed after the mask pattern has been exposed and removed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.