Resist compositions
US5352564A · kind A · utility
42Cited by
2References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 19, 1994 |
| Grant date | Oct 4, 1994 |
| Priority date | — |
| Expiry date | Jan 19, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/11
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition comprising a base resin, an acid release agent, and a dissolution inhibitor is improved in sensitivity and resolution when the base resin is typically selected from poly-t-butoxystyrene/poly-hydroxystyrene, poly-t-butoxystyrene/poly-p-methoxymethoxystyrene/polyhydroxystyrene, and poly-t-butoxystyrene/poly-p-methoxystyrene/polyhydroxystyrene copolymers. The composition forms a resist useful for the manufacture of LSI.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.