Laser imageable photomask constructions
US5354633A · kind A · utility
30Cited by
43References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 22, 1993 |
| Grant date | Oct 11, 1994 |
| Priority date | — |
| Expiry date | Sep 22, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/50
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Novel photomask blanks and methods for producing photomasks using laser-imaging apparatus. The photomask blanks include at least one layer that absorbs laser energy and ablates in response thereto, and, where unremoved as a result of the imaging process, perform the masking function by blocking the passage of actinic radiation; and a a mechanically strong, durable and flexible substrate that is substantially transparent to actinic radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.