Process providing durable stain-resistance using methacrylic acid polymers
US5356689A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Apr 26, 1993 |
| Grant date | Oct 18, 1994 |
| Priority date | — |
| Expiry date | Apr 26, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T442/2893
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Process for imparting to polyamide substrates resistance to staining by acid dyes which is durable to shampooing and resistance to yellowing caused by exposure to UV and/or NO.sub.x, comprising applying to said substrate (A) one or more epoxy resins and (B) a polymeric stain-resist agent consisting essentially of (i) copolymers containing more than 75 weight percent methacrylic acid and less than 25 weight percent of one or more other ethylenically unsaturated monomers, or (ii) polymers prepared by polymerizing (a) methacrylic acid or (b) mixtures of methacrylic acid and one or more other ethylenically unsaturated monomers, in the presence of a sulfonated hydroxyaromatic-formaldehyde condensation product.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.