Excellent far-infrared radiating material
US5356724A · kind A · utility
26Cited by
3References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 15, 1993 |
| Grant date | Oct 18, 1994 |
| Priority date | — |
| Expiry date | Jan 15, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/12618
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A material for producing far-infrared radiation is disclosed. The material comprises a substrate and an Al--Mn alloy-derived oxide surface layer on the substrate, the oxide surface layer being porous with an average pore diameter of 0.01-2.0 micrometers and a porosity of 10.sup.3 -10.sup.12 pores/cm.sup.2, the weight ratio of Mn/Al of the oxide surface layer being 0.001-2.0, and the thickness of the oxide surface layer being 0.1-100 micrometers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.