Volumetric flow corrector having a densitometer
US5357809A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Apr 14, 1993 |
| Grant date | Oct 25, 1994 |
| Priority date | — |
| Expiry date | Apr 14, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N9/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method an apparatus for measuring a base condition volumetric flowrate of a pipeline gas flowing through a pipeline in which a pipeline gas flowrate is measured by a pipeline gas flowmeter; a volumetric correction ratio is derived by: measuring a sample gas flowrate of sample gas tapped from the pipeline, measuring an energy flowrate of the sample gas, measuring a heating value of the sample gas, and measuing a base condition density of the sample gas; and the base condition volumetric flowrate of the pipeline gas flowing through the pipeline is determined by adjusting the pipeline gas flowrate as measured by the pipeline gas flowmeter by the volumetric correction ratio. The temperature of the sample gas should be substantially the same as the pipeline gas in the pipeline when the sample gas flowrate is measured.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.