Process for the removal of a silicon coating from a surface
US5358603A · kind A · utility
9Cited by
8References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 6, 1992 |
| Grant date | Oct 25, 1994 |
| Priority date | — |
| Expiry date | Oct 6, 2012 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J8/1872
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
This invention relates to a process for etching a silicon coat on the inside wall of a tube. The tube may be a product discharge tube associated with a fluidized bed reactor used in the thermal production of silicon from a silicon containing compound, e.g., silane. The process features: a) heating the silicon coat to a temperature within the range of from about 500.degree. to about 750.degree. C., such heating occurring principally with radiant heat from a heating means inserted within the interior of the tube; and (b) contacting the heated silicon coat with a mineral acid which etches the heated silicon coat.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.