Method for low pressure spin coating and low pressure spin coating apparatus
US5358740A · kind A · utility
63Cited by
19References
35Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 11, 1994 |
| Grant date | Oct 25, 1994 |
| Priority date | — |
| Expiry date | Jan 11, 2014 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D1/005
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus and method is provided for spin coating films on a surface. The apparatus includes a chamber capable of being closed to the atmosphere, a spinnable member within the chamber capable of supporting the surface and a pump capable of reducing the pressure within the chamber. The method includes depositing a liquid on the surface, reducing the pressure in the vicinity of the surface and spinning the surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.