Apparatus for diamond deposition by microwave plasma-assisted CVPD
US5360485A · kind A · utility
5Cited by
4References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 10, 1992 |
| Grant date | Nov 1, 1994 |
| Priority date | — |
| Expiry date | Jul 10, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32357
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus for depositing diamond on a substrate assisted by microwave plasma, comprising two zones, a plasma formation zone located in a waveguide and a diamond deposition zone located outside the waveguide. The apparatus includes means making it possible to form a stable plasma in the deposition zone, so as to considerably increase the substrate surface which can be treated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.