Method of fabricating laser controlled nanolithography
US5360764A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 16, 1993 |
| Grant date | Nov 1, 1994 |
| Priority date | — |
| Expiry date | Feb 16, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/3086
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of depositing atoms on a substrate in which a beam of atoms is optically focused utilizing a laser beam. The laser beam is used to form a standing wave above the surface of a substrate. As the beam of atoms is passed through the standing wave, the atoms are focused by dipole force interactions. The deposition of atoms is focused into parallel lines which coincide with the minima of the standing wave. The use of two standing waves allows for focusing the atoms into discrete dots or spots. Relative movement between the substrate and the standing wave(s) allows for depositing atoms in a scanning manner. Various nanostructures can be made by the disclosed method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.