High melting point crystalline polyamides
US5362846A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 11, 1993 |
| Grant date | Nov 8, 1994 |
| Priority date | — |
| Expiry date | Jun 11, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G69/28
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Copolyamides having high crystallinity over the whole composition range, a melting enthalpy .DELTA.H>3.5 cal/g and a melting point T.sub.M higher than 270.degree. C. and articles manufactured therefrom are disclosed, said copolyamides comprising, by moles: PA0 a) 1 to 99% of a unit A of formula EQU --(NH--R--NHCO--AR.sub.1 --CO)-- PA0 in which R is a --(CH.sub.2).sub.n --carbon chain where n is coma) between 4 and 20, and AR.sub.1 is the residue from the condensation of terephthalic acid and/or of the diester form thereof; and PA0 b) 99 to 1% of a unit B of formula EQU --(NH--R--NHCO--AR.sub.2 --CO)-- PA0 in which R is the same carbon chain as in unit A and AR.sub.2 is the residue from condensation of naphthalene-2,6-dicarboxylic acid and/or the diester form thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.