Boride, carbide, nitride, oxynitride, and silicide infiltrated electrochemical ceramic films and coatings and the method of forming such
US5364522A · kind A · utility
Inventor
Key dates
| Filing date | Mar 22, 1993 |
| Grant date | Nov 15, 1994 |
| Priority date | — |
| Expiry date | Mar 22, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D5/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Ceramic films and coatings, single or multi-layered, including superlattice, infiltrated with boride, carbide, nitride, oxynitride, and silicide were formed by methods which comprises of an electrochemical coating of a ceramic precursor by a constant or an amplitude-modulated electric current with a DC component in a medium containing at least one of the ionic species for the composition of the ceramic precursor, following single or multiple infiltration in a medium containing at least one of the compounds selected from a B-containing compounds, a C-containing compounds, a N-containing compounds, a Si-containing compounds, and a mixture thereof, by heating means selected from radio-frequency, microwave, thermal, flame, plasma, laser, and a mixture thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.