Polishing composition
US5366542A · kind A · utility
72Cited by
9References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 7, 1992 |
| Grant date | Nov 22, 1994 |
| Priority date | — |
| Expiry date | Dec 7, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09G1/02
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to a polishing composition comprising water, alumina, and a chelating agent. It may optionally be incorporated with an aluminum salt and/or boehmite. The present composition permits efficient polishing and gives a polished surface having superior surface properties. The composition is suitable for polishing a memory hard disk.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.