Aerosol-plasma deposition of films for electronic cells
US5366770A · kind A · utility
135Cited by
4References
10Claims
0Family size
Inventor
Key dates
| Filing date | Sep 13, 1993 |
| Grant date | Nov 22, 1994 |
| Priority date | — |
| Expiry date | Sep 13, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/704
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An atmospheric process for the production of a coating of film upon a nickel-containing substrate. In the first step of this process, an aerosol mist containing reactants necessary to form the coating is provided. Thereafter, the mist is subjected to radio-frequency radiation while in the plasma region. Thereafter, the vaporized mixture is then deposited onto a nickel substrate. In subsequent steps, one or more other layers of vaporized material may be deposited onto the coated substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.