Gas supplying system and gas supplying apparatus
US5368062A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Jan 28, 1993 |
| Grant date | Nov 29, 1994 |
| Priority date | — |
| Expiry date | Jan 28, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/87249
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas supplying system for supplying a corrosive gas or the like to a semiconductor manufacturing apparatus or the like. A plurality of kinds of component gases are introduced into a chamber and mixed therein to form a desired supply gas. After supplying the desired supply gas, the chamber is evacuated and an inert gas is charged into the chamber to substitute a residual supply gas remaining in the chamber by the inert gas. The evacuation of the chamber and the charging of the inert gas into the chamber are repeated two or more times. Accordingly, the residual supply gas can be efficiently removed from the chamber and substituted by the inert gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.