Chromatically compensated particle-beam column
US5369279A · kind A · utility
14Cited by
4References
7Claims
0Family size
Inventor
Key dates
| Filing date | Aug 20, 1993 |
| Grant date | Nov 29, 1994 |
| Priority date | — |
| Expiry date | Aug 20, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/1534
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A particle-beam column comprising a needle-type ions source such as a liquid metal ion source, one or more round lenses, and a plurality of interleaved quadrupole lenses, by means of which the chromatic aberration of the column may be reduced or entirely compensated. Also an ion-beam column comprising a liquid alloy ion source, interleaved quadrupole lenses, and a Wien velocity filter, whereby a focused beam of ions of a single atomic number may be produced. Such columns produce a more finely focused beam than columns based only on electrostatic lenses, and allow increased lens apertures and larger beam currents.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.