Exposure system for photographic copying machines
US5369466A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Sep 8, 1993 |
| Grant date | Nov 29, 1994 |
| Priority date | — |
| Expiry date | Sep 8, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/547
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The exposure system includes a bulb housing, an ellipsoid reflector, and a light source located near a first focal point of the ellipsoid reflector. With respect to the light beam path, an optical unit is located in front of the plane of an original to be copied in order to produce a desired distribution of the exposure intensity onto the original. Imaging optics are located in a light beam path behind the plane of the original, for reproducing the original onto photographic copying material. Furthermore, the exposure system includes a device for dyeing the light that illuminates the original. The device for dyeing is located in the light beam path in front of the optical unit and includes color filters which can be moved into and out of the light beam path on a plane that is perpendicular to the optical axis. The light source can be moved along the optical axis. The device for dyeing the light beam is located between the light source and the optical unit such that a light beam that penetrates a point of an edge of the original and intersects the optical axis at the location of an entry pupil of the imaging optics, also intersects the optical axis at the location of the device for …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.