Ultraviolet blocking polysiloxane resin and process for making the same
US5371138A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 21, 1991 |
| Grant date | Dec 6, 1994 |
| Priority date | — |
| Expiry date | Aug 21, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2217/74
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A poysiloxane resin composition includes a blend of silanols, colloidal silica, an ultraviolet-absorbing material, and a dye for correcting the color of a film formed from the resin composition. The silanols include a silanol from the group having the formula R.sub.w Si(OH).sub.x or R.sub.y Si(OR').sub.z where (w+x) or (y+z)=4, and R and R' are organic radicals without any crosslinking sites, silanol from the group having the formula R"Si(OR'").sub.3 where R" is a hydrogen atom or an organic radical and R"' is an organic radical containing a crosslinking site. The resin may be cured at 420.degree. F. The ultraviolet-absorbing material may be a benzophenone, a benzotriazole, or a benzothiazole. A process for forming the resin composition includes reacting the silanols and the ultraviolet-absorbing material under continuous agitation for about six hours.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.