Low aberration diffraction grating system
US5371586A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 9, 1992 |
| Grant date | Dec 6, 1994 |
| Priority date | — |
| Expiry date | Oct 9, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/6473
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A light analysis system is disclosed and comprises a source of substantially collimated light to be analyzed. The source comprises a sample excited by a collimated laser light source, and further comprises a holographic notch filter having the characteristic of reflecting light at the excitation wavelenghth at which the source is excited. An aberration corrected concave focusing diffraction grating receives the collimated light and focuses it at a point corresponding to its wavelength. A detector detects light at a desired wavelength focused by the diffraction grating. The holographic notch filter is positioned to filter the source of substantially collimated light to be filtered and the holographic notch filter is oriented substantially at an angle with respect to the collimated laser light source to result in a path length for the collimated laser light source which constrains a path length through the notch filter which causes the collimated laser light to be reflected by the filter away from the grating. The grating is an aberration corrected concave focusing diffraction grating. The collimated light is in the form of a bundle having a width on the order of ten millimeters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.