Method of manufacturing a chemically adsorbed film
US5372851A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 2, 1992 |
| Grant date | Dec 13, 1994 |
| Priority date | — |
| Expiry date | Dec 2, 2012 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D3/144
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
This invention aims to form uniformly and effectively an ultra thin chemical adsorbing film having an excellent water repellent property, oil repellent property, and contamination-proof property on the surface of a substrate by chemically adsorbing in a gas phase atmosphere. A chemically adsorbed film can be formed on any type of substrate and in a short time by chemically adsorbing a chlorosilane based surface-active agent on the surface of a substrate having active hydrogen groups. Further, a chemically adsorbed monomolecular film, or a polymer film, can be formed on any type of substrate and in a short time by forming a siloxane based monomolecular film or a polysiloxane adsorbed film in a gas atmosphere having a chlorosilane based surface-active agent having plurality of chlorosilyl groups.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.