Method of processing photosensitive glass
US5374291A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | May 21, 1993 |
| Grant date | Dec 20, 1994 |
| Priority date | — |
| Expiry date | May 21, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S65/04
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method of processing a photosensitive glass includes exposing. Photosensitive glass by radiation from a laser whose oscillation wavelength lies within the range of wavelengths of exposing light to which the glass responds. Then, the exposed portions 1c are thermally developed and etched. Since a laser beam propagates with a high rectilinearity, the front and rear surfaces of thick photosensitive glass can be exposed without producing dimensional errors. Therefore, the etching accuracy is improved. Especially, where the front and rear surfaces of photosensitive glass are etched, both surfaces can be processed so as to form the same shape in them accurately. In addition, because almost all the energy of the laser radiation is used for exposure of the photosensitive glass, the energy is not wasted and so the efficiency is high.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.