Process for preparation of organooxysilanes
US5374761A · kind A · utility
11Cited by
11References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 29, 1994 |
| Grant date | Dec 20, 1994 |
| Priority date | — |
| Expiry date | Apr 29, 2014 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07F7/06
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A process for the organooxylation of chlorosilanes. The process comprises contacting in a film a chlorosilane and an alcohol capable of forming an ester with the silicon of the chlorosilane and thereby forming an equilibrium mixture comprising an organooxysilane and hydrogen chloride. The film is heated at a temperature sufficient to cause vaporization of the hydrogen chloride from the equilibrium mixture thereby increasing the yield of organooxysilane in the equilibrium mixture. In a preferred process, the process is run in a falling-film type reactor or a wiped-film type reactor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.