Plasma sterilizing with downstream oxygen addition
US5376332A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 22, 1993 |
| Grant date | Dec 27, 1994 |
| Priority date | — |
| Expiry date | Feb 22, 2013 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61L2/14
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A method for plasma sterilization includes forming a gas plasma from a substantially oxygen-free mixture containing argon or helium and from 1% to 5% (v/v) hydrogen in a plasma generating chamber, and exposing an article to be sterilized in a sterilizing chamber to a non-explosive mixture of the plasma gas and from 1% up to 20% (v/v) oxygen gas. Preferably, the pressure in the sterilizing chamber is from 0.1 to 10 torr and the chamber temperature is less than 6.degree. C., the mixture from which the plasma is generated contains from 4% to 5% (v/v) hydrogen, and the article in the sterilizing chamber is exposed to a mixture of plasma gas and from 1% to 10% (v/v) oxygen.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.