Silver halide photographic light-sensitive material
US5376516A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 20, 1994 |
| Grant date | Dec 27, 1994 |
| Priority date | — |
| Expiry date | Jun 20, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/162
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A silver halide photographic light-sensitive material is disclosed, which comprises a support and a silver halide photographic emulsion layer and a protective layer provided in that order on a first side of the support, and a backing layer and a protective backing layer provided in that order on a second side of the support opposite to the silver halide photographic emulsion layer, an outermost layer of the material containing a fluorine-containing anionic surfactant and a fluorine-containing cationic surfactant and an outermost layer on the second side of the support containing a compound represented by the Following formula (A) or (B): EQU Formula (A) RCOOM EQU Formula (B) R.sub.1 --CO--O--X--O--CO--R.sub.2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.